JPS546866B2 - - Google Patents
Info
- Publication number
- JPS546866B2 JPS546866B2 JP6441571A JP6441571A JPS546866B2 JP S546866 B2 JPS546866 B2 JP S546866B2 JP 6441571 A JP6441571 A JP 6441571A JP 6441571 A JP6441571 A JP 6441571A JP S546866 B2 JPS546866 B2 JP S546866B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Mounting And Adjusting Of Optical Elements (AREA)
- Optical Filters (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6441571A JPS546866B2 (en]) | 1971-08-25 | 1971-08-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6441571A JPS546866B2 (en]) | 1971-08-25 | 1971-08-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4830874A JPS4830874A (en]) | 1973-04-23 |
| JPS546866B2 true JPS546866B2 (en]) | 1979-04-02 |
Family
ID=13257622
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6441571A Expired JPS546866B2 (en]) | 1971-08-25 | 1971-08-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS546866B2 (en]) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06125B2 (ja) * | 1982-10-25 | 1994-01-05 | アロカ株式会社 | 超音波診断装置 |
| JPS6090542A (ja) * | 1983-10-24 | 1985-05-21 | 株式会社日立製作所 | 超音波診断装置 |
| JPH0310732Y2 (en]) * | 1985-10-30 | 1991-03-18 | ||
| JPS61181472A (ja) * | 1985-02-08 | 1986-08-14 | 福留 武朗 | 血管穿刺法及び穿刺具 |
| JPS61226924A (ja) * | 1985-04-01 | 1986-10-08 | Canon Inc | 露光装置 |
| JPH0628223B2 (ja) * | 1985-08-21 | 1994-04-13 | キヤノン株式会社 | パターン焼き付け方法 |
| JPH0738857B2 (ja) * | 1985-08-29 | 1995-05-01 | 株式会社東芝 | 結石破砕装置 |
| JPS62183772A (ja) * | 1986-02-10 | 1987-08-12 | 福留 武朗 | 脈管穿刺具 |
| EP0260953B1 (en) * | 1986-09-18 | 1994-03-30 | Paul G. Yock | Device for use in the cannulation of blood vessels |
| US4760429A (en) * | 1986-11-05 | 1988-07-26 | The Perkin-Elmer Corporation | High speed reticle change system |
| US4758863A (en) * | 1987-02-17 | 1988-07-19 | Hewlett-Packard Company | Multi-image reticle |
| JPS6379318A (ja) * | 1987-09-11 | 1988-04-09 | Hitachi Ltd | 縮小投影露光方法 |
| JPH02107238A (ja) * | 1988-10-17 | 1990-04-19 | Aloka Co Ltd | 穿刺針式超音波診断装置 |
| JPH02107237A (ja) * | 1988-10-17 | 1990-04-19 | Aloka Co Ltd | 穿刺針式超音波診断装置 |
| US5235626A (en) * | 1991-10-22 | 1993-08-10 | International Business Machines Corporation | Segmented mask and exposure system for x-ray lithography |
| JP2656204B2 (ja) * | 1993-06-04 | 1997-09-24 | キヤノン株式会社 | マスク交換装置 |
| JP5066948B2 (ja) * | 2007-03-06 | 2012-11-07 | 株式会社ニコン | マスク保持装置、マスク調整方法、露光装置及び露光方法 |
| WO2014093374A1 (en) | 2012-12-13 | 2014-06-19 | Volcano Corporation | Devices, systems, and methods for targeted cannulation |
-
1971
- 1971-08-25 JP JP6441571A patent/JPS546866B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4830874A (en]) | 1973-04-23 |